Atomic Layer Deposition of copper - If you like sputtering, you'll love this!

Video Description

An explanation and demo of atomic layer deposition (ALD) of copper metal on glass. Precursors are copper(I) chloride and hydrogen, processed in a hot-wall tube quartz tube furnace. 10 torr operating pressure 500 sccm argon sweep/purge gas constantly flowing 75 sccm CuCl argon pulse gas (17 seconds including flow controller lag) 100 sccm H pulse gas (14 seconds including flow controller lag) 7 second purge time between pulses 100mm quartz tube furnace diameter 415*C deposition temperature 350*C CuCl evaporation temperature Substrates are mostly borosilicate glass cleaned with RCA clean The "good" samples shown in the video are about 750 cycles (about 9 hours Main ref: https://sci-hub.se/https://doi.org/10.1002/cvde.19970030107 Also helpful: https://sci-hub.se/https://doi.org/10.1063/1.5087759 https://sci-hub.se/10.1149/2.0261501jss https://sci-hub.se/https://doi.org/10.1016/0022-0248(92)90191-K Alicat flow controller manuals (hard to find via website navigation): https://documents.alicat.com/manuals/DOC-MANUAL-MC.pdf https://documents.alicat.com/manuals/old/Gas_Flow_Controller_Manual_rev7.pdf https://documents.alicat.com/Alicat-Serial-Primer.pdf RCA clean: https://en.wikipedia.org/wiki/RCA_clean CuCl synthesis: http://wwwchem.uwimona.edu.jm/lab_manuals/c1901exp35.html Support Applied Science on Patreon: https://www.patreon.com/AppliedScience